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July 1, 1998Journal of Applied Physics

Stress reduction in silicon dioxide layers by pulsing an oxygen/silane helicon diffusion plasma

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Authors

CCChristine CharlesUniversité Claude Bernard Lyon 1RBR. W. BoswellAustralian National University

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Charles et al. (1998) studied this question.

synapsesocial.com/papers/6a924240ddea3fd329963098https://doi.org/10.1063/1.368034
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