Transport of oxygen in amorphous Ge thin films during annealing

M. L. Knotek

doi:10.1116/1.568737

January 1, 1975Journal of Vacuum Science and Technology

Transport of oxygen in amorphous Ge thin films during annealing

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Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation M. L. Knotek; Transport of oxygen in amorphous Ge thin films during annealing. Journal of Vacuum Science and Technology 1 January 1975; 12 (1): 117–120. https://doi.org/10.1116/1.568737 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search

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synapsesocial.com/papers/6a92aa3b6cd82e562097ad86 https://doi.org/10.1116/1.568737

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Transport of oxygen in amorphous Ge thin films during annealing

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Transport of oxygen in amorphous Ge thin films during annealing

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