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August 1, 1975Japanese Journal of Applied PhysicsOpen Access

Structures of Si Films Chemically Vapor-Deposited on Amorphous SiO2Substrates

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NNNaoyuki NagasimaHitachi (Japan)NKNagiko KubotaHitachi (Japan)

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Nagasima et al. (1975) studied this question.

synapsesocial.com/papers/6a92e47e984181229d925c2ahttps://doi.org/10.1143/jjap.14.1105
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