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November 1, 1981Journal of Vacuum Science and Technology

Masked ion-beam lithography: A feasibility demonstration for submicrometer device fabrication

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Authors

JBJ. L. BarteltInstitute for EthnoMedicineCSCharles SlaymanCisco Systems (United States)JWJohn WoodParsons (United States)

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Bartelt et al. (1981) studied this question.

synapsesocial.com/papers/6a93a15af3532cd145ebc341https://doi.org/10.1116/1.571236
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