Order of Reaction between Photoresist and Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst

This paper clarifies the reaction order of photoresist removal using atomic hydrogen by investigating the relationship between atomic hydrogen density ( n H ) and photoresist removal rate ( v rmv ). Atomic hydrogen was generated by decomposing hydrogen molecules with a tungsten hot-wire catalyst. In the reaction between atomic hydrogen and photoresist, we found that v rmv increases in direct proportion to n H and revealed that the reaction exhibited a first-order kinetics with respect to n H .