A new method of obtaining a high-density plasma (n ∼ nc0) in a resonant cavity is described. The method is to increase the frequency of the exciting microwave power source by as much as ∼ 10% while keeping the input microwave power constant and maintaining an impedance match between the source and the cavity. Density increases of the order of seven-fold have been obtained in this way. The result is explained mainly on the basis that the power loss in the impedance-matching network decreases as the excitation frequency is increased.
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Halverson et al. (1969) studied this question.
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