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September 1, 1985IEEE Transactions on Electron Devices

Three-dimensional photoresist image simulation on flat surfaces

Toshiharu Matsuzawa T. Ito Masato Tanuma

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Abstract

A simulation procedure for three-dimensional (3-D) photoresist images on flat substrates is developed. The procedure consists of three parts, i.e., two-dimensional (2-D) distribution of projected light intensity, 3-D photosensitizer concentration distribution, and 3-D photoresist development. For the former two simulations, conventional procedures have been employed. The last development simulation is carried out by extending the ray tracing model to three dimensions. A successful result is obtained for the resist system with a weak standing-wave effect.

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Cite This Study

Matsuzawa et al. (1985) studied this question.

synapsesocial.com/papers/6a9464e880af60f926707bbb https://doi.org/10.1109/t-ed.1985.22197

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