Answers are grounded in this paper and cite their sources.
A simulator for a three-dimensional (3-D) photoresist image formation on flat substrates has been developed. Named Three-Dimensional Resist Imaging Process Simulator-I (TRIPS-I), the simulator consists of three subsimulators: one for the two-dimensional (2-D) distribution of projected light intensity, one for 3-D photosensitizer concentration distribution, and one for 3-D photoresist development. In regard to the first two, conventional procedures have been employed. The last, however, involves adoption of a ray tracing model based on the principle of least time.
No takes yet. Share an insight, caveat, or question.
Matsuzawa et al. (1985) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: