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In this article, the surfactant capability of In for AlGaN growth by plasma-assisted molecular beam epitaxy has been assessed. We have determined the range of substrate temperatures and In fluxes to form a self-regulated 1×1 In adlayer on AlxGa1−xN(0001). The presence of this In film favors two-dimensional growth of AlGaN under stoichiometric conditions. The formation of metal droplets on the surface is inhibited. In incorporation, if any, is lower than 0.01%. The structural quality of the layers is verified by high-resolution x-ray diffraction, both in symmetric and asymmetric reflections.
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Monroy et al. (2003) studied this question.
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