We report an InP/InGaAs/InP double heterojunction bipolar transistor (DHBT), fabricated using a mesa structure, exhibiting 282 GHz f/sub /spl tau// and 400 GHz fmax. The DHBT employs a 30 nm InGaAs base with carbon doping graded from 8/spl middot/10/sup 19//cm3to 5/spl middot/10/sup 19//cm3, an InP collector, and an InGaAs/InAlAs base-collector superlattice grade, with a total 217 nm collector depletion layer thickness. The low base sheet (580 /spl Omega/) and contact (2) resistivities are in part responsible for the high fmaxobserved.
No takes yet. Share an insight, caveat, or question.
Dahlstrǒm et al. (2003) studied this question.