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February 14, 1994Applied Physics Letters

Atomic hydrogen-induced interface degradation of reoxidized-nitrided silicon dioxide on silicon

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Authors

ECE. CartierIBM (United States)DBD. A. BuchananIBM (United States)GDG.J. DunnPrince Mohammad bin Fahd University

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Cartier et al. (1994) studied this question.

synapsesocial.com/papers/6a94f331dd1b902261fa53b3https://doi.org/10.1063/1.110990
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