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May 15, 2008Journal of Micromechanics and MicroengineeringOpen Access

Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

Yiping Zhao Erwin Berenschot M. de Boer Henri Jansen Niels R. Tas Jurriaan Huskens

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Abstract

Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography, Zhao, Yiping, Berenschot, Erwin, de Boer, Meint, Jansen, Henri, Tas, Niels, Huskens, Jurriaan, Elwenspoek, Miko

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Cite This Study

Zhao et al. (2008) studied this question.

synapsesocial.com/papers/6a956ccf6d03747e5a2cbef6 https://doi.org/10.1088/0960-1317/18/6/064013

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Keep reading

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

1Imprint of sub-25 nm vias and trenches in polymersOriginal Research · 1995 · 2,710 citations
2Recent progress in nanoimprint technology and its applicationsReview · 2004 · 736 citations
3Sub-10 nm imprint lithography and applicationsOriginal Research · 1997 · 1,123 citations
4Diamond nanoimprint lithographyOriginal Research · 2002 · 65 citations
5Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a maskOriginal Research · 2006 · 21 citations

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