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Gas aggregation cluster source based on planar magnetron was used for deposition of fluorocarbon nanocluster films. The films possess a high roughness with a size of nanoclusters estimated to be about 30 nm in average. Their chemical structure was found to resemble that of a conventional bulk polytetrafluoroethylene which was confirmed by X‐ray photoelectron spectroscopy and Fourier‐transform infrared spectroscopy. The fluorine to carbon elemental ratio was found to be 1.95 with 86% of CF2 structural units. The deposited films revealed super‐hydrophobic character with values of water contact angle reaching over 170°. magnified image
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Drábik et al. (2012) studied this question.
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