A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching

A method for decreasing the lateral size of conducting polymer patterns is demonstrated. Up to 15–70% shrinkage can be achieved based on nanoimprint lithography and isotropic plasma etching (see image). The conducting polymer patterns can direct the assembly of silver nanoparticles. This is a simple route for patterning high-resolution conducting polymers.