A quarterwave-thick narrow-bandwidth antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The laser damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.
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Ian M. Thomas (1986) studied this question.
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