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The etching of ceramic PbTi1−xZrxO3 (PZT) by XeCl excimer laser radiation has been investigated. In air, the threshold fluence for etching was about 2 J/cm2. At fluences of 10 J/cm2, etch rates of 0.1 μm/pulse were observed. The geometry of etched structures can readily be defined by choosing suitable experimental conditions, suggesting potential applications of this process to the production of devices.
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Eyett et al. (1987) studied this question.
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