Characteristics of Silicon Dioxide Film Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethoxysilane and Ozone with Alcohol Addition

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We evaluate the characteristics of silicon dioxide film deposited by atmospheric-pressure chemical vapor deposition (APCVD) using tetraethoxysilane and ozone ( TEOS/O3) with alcohol addition and the role of the alcohol in the reaction system using ethanol- D6. The deuterium substituted ethanol, like normal ethanol, decreases the effective ozone concentration. Secondary ion mass spectroscopy (SIMS) analysis detects a uniform distribution of hydrogen and deuterium incorporated into the deposited film. Fourier transform infrared spectroscopy (FT-IR) spectra show the relationship between the content of the terminal groups in the film and the effective ozone concentration. Three states in thermal desorption spectroscopy (TDS) spectra are characterized: water absorbed after film deposition, water absorbed during film deposition, and terminal groups (i.e., Si-H and Si-OH) in the film in order of annealing temperature. Moreover, it is found that the third state contains two peaks due to deuterium substitution. One of the peaks in the third state is associated with the flowing-like profile formation.