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November 1, 1991Japanese Journal of Applied Physics

50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists

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NKNobuyoshi KoshidaHosei UniversityKYKazuyoshi YoshidaKanazawa UniversitySWShinichi WatanukiTokyo University of Agriculture and Technology

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Koshida et al. (1991) studied this question.

synapsesocial.com/papers/6a9873d2dbbffdef42d99a18https://doi.org/10.1143/jjap.30.3246
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  5. 5Microlithographic behavior of transition metal oxide resists exposed to focused ion beam1990 · 11 citations