Preparation and structural characterization of, and chemical vapor deposition studies with, certain yttrium tris(β‐diketonate) compounds

The preparation of [Y(tmhd)3 · H2O]2, Y(tmhd)3 and [Y(tmhd)3]2 (tmhd = 2,2,6,6‐tetramethylheptane‐3,5‐dionate; tmod = 2,2,7‐trimethyloctane‐3,5‐dionate) are described. These compounds have been characterized by 1H and 13C NMR, IR, UV/vis, TGA and GC/MS techniques. Crystal data include: [Y(tmhd)3 · H2O]2, Space Group P1, a = 11.6 Å, b = 14.6 Å, c = 14.9 Å, α = 60.5°, β = 63.1°, γ = 73.3°, V = 1937 Å3, z = 2, dc = 1.095, refcoll = 7165, refind = 7165, refsig = 4923, R = 7.0 %, Rw = 8.8 %; [Y(tmod)3]2, Space Group P21/n, a = 13.0 Å, b = 15.4 Å, c = 18.3 Å, β = 91.5°, V = 3670 Å3, z = 4, dc = 1.156, refcoll = 6642, refind = 6642, refsig = 2649, R = 10.6 %, Rw = 10.3 %. The vapor pressures of the compounds are discussed in the light of ligand symmetry concerns. Chemical vapor deposition experiments with these compounds produced films which were characterized by XRD, SEM, ESCA and surface profilometry. Film deposit composition and morphology are related to deposition ambient.