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May 1, 1980Journal of Applied Physics

Electron spectroscopy study of silicon surfaces exposed to XeF2 and the chemisorption of SiF4 on silicon

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TCT. J. ChuangLawrence Berkeley National Laboratory

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T. J. Chuang (1980) studied this question.

synapsesocial.com/papers/6a99ad4bd2b4eca9f733a36dhttps://doi.org/10.1063/1.327990
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