In this study, GaN-based vertical light-emitting diodes (VLEDs) were fabricated by a laser lift-off (LLO) process and the effects of microlens formation by plasma etching on the optical properties of the LLO GaN-based VLED devices were investigated. By forming a 5–10 µm microlens array on the LLO GaN-based VLEDs, the measured light emission intensities at 460 nm and in the direction normal to the surface of the device increased by approximately 40% and 100% compared with those of the LLO GaN-based VLED without the microlens array for 10 µm and 5 µm microlens arrays, respectively.
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Kim et al. (2004) studied this question.
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