Size effect on the structure of nanocrystalline and cluster films of hafnium diboride

Hafnium diboride films have been obtained by the method of nonreactive hf magnetron sputtering in an argon atmosphere. It has been shown that the determining role in the processes of the formation of the structure of these films belongs to the size effect. The coatings with a highly pronounced texture were characterized by a clearly pronounced anisotropy of the sizes of coherent domains (the axial ratio of the crystal lattice c/a ≈ 1.1, which is close to the tabulated value) and by high residual compressive macrostresses ∼8 GPa. As the degree of texture decreased, there formed structures with axial ratios c/a ≈ 1.05–1.07; simultaneously, there occurred a decrease in the sizes of coherent domains and a reduction of residual macrostresses. Upon the formation of amorphous cluster films with a grain size of ∼5 nm, close-packed structures with a structure close to cubic were formed.