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The effect of applied voltage on the structure and composition of tantalum diboride films deposited by rf magnetron sputtering on steel substrates has been studied using x-ray diffraction and secondary ion mass spectrometry. It is established that, by varying the bias voltage, it is possible to obtain nanocrystalline textured and untextured deposits with various phase compositions.
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Goncharov et al. (2007) studied this question.
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