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Carbon nanotube field effect transistors (CNTFETs) are considered ideal components for radiation-hardened integrated circuits (ICs) due to their material and structural properties. CNTFETs have been shown to have good tolerance to total ionizing dose (TID) effects under no-bias condition. However, in practical applications, ICs typically operate under specific bias conditions. It is necessary to evaluate the TID effects of CNTFETs under different bias conditions. A wafer-level chip probe power-up system was designed to power CNTFETs during Co-60 γ-ray irradiation. The experimental results show that the bias condition greatly affects the TID tolerance of the CNTFET. Under the no-bias condition, the CNTFET is tolerant to TID up to 2000 k rad (Si). On the contrary, under off-bias condition, the failure occurs at 200 k rad (Si). The failure of the CNTFET is characterized by out-of-control gate voltage and its failure mechanism is analyzed. It is attributed to the breakdown of the gate dielectric (HfO2) between the gate and the source via the time-dependent dielectric breakdown (TDDB) effect.
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Liang et al. (2025) studied this question.
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