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June 20, 1994Applied Physics Letters

Pulse-time-modulated electron cyclotron resonance plasma etching for highly selective, highly anisotropic, and notch-free polycrystalline silicon patterning

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Authors

SSSeiji SamukawaNational Yang Ming Chiao Tung University

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Seiji Samukawa (1994) studied this question.

synapsesocial.com/papers/6a9bc3dc6aa4d2b65295475bhttps://doi.org/10.1063/1.111290
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