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The electrical resistance measurement of metallic conducting materials can be done in situ in a diamond-window, high-pressure cell with a four-lead arrangement designed to avoid contact and lead-wire resistances. Variants of the general method include designs for long (several cm) and short (less than 1 mm) length of samples material, and for the use of solid and fluid pressure-transmitting media.
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Mao et al. (1981) studied this question.
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