Low resistivity cubic phase CdS films by chemical bath deposition technique

In this letter we report on cubic CdS thin films with low resistivity by chemical bath deposition (CBD) technique and subsequent annealings in S2 and H2+In. Low temperature photoluminescence, x rays, and transmission spectra support the assumption that S2 annealings contribute to fill the vacancies in the as-deposited films leading to an enlargement of the CdS cubic cell. This fact is revealed by an increase in interplanar distances, evanescence of the PL red broad band, and decrease in band-gap energies. Cubic phase remains after H2+In annealing at higher temperatures. A resistivity as low as 11 Ω cm was obtained at an optimum annealing temperature of 350 °C.