The influence of argon gas pressure (0.15–40 Pa) on the microstructure of dc planar-magnetron-sputtered stainless steel and reactively sputtered carbon and silicon films has been investigated for films of thickness ∠1 μm. The carbon and silicon films are amorphous and incorporate hydrogen. Classification of the film structures is in accordance with the general zone model proposed by Thornton, although the voided boundaries characteristic of zone I columnar structure which are observed for stainless steel films do not develop for the carbon and silicon films. The implications of film structure for potential solar energy applications are discussed.
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Craig et al. (1982) studied this question.