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Pulsed versus continuous wave plasma polymerization of perfluorocyclohexane is compared as a function of duty cycle off-time, on-time, and peak power. The chemical composition of the deposited films has been determined by X-ray photoelectron spectroscopy (XPS). A greater retention of the chemical structure associated with the precursor molecule is found for the pulsed plasma polymerization experiments. This can be rationalized in terms of the relative perturbation of reactive species contained in the electrical discharge.
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Hynes et al. (1996) studied this question.
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