Ultrahigh vacuum multipurpose offset manipulator for surface and thin film reaction studies

A novel ultrahigh vacuum (UHV) manipulator has been constructed which allows positioning of a sample on any point of an 11.5-cm radius main circle and provides two orthogonal off-axis rotations at the selected point. The motions are a 0 °–90 ° tilt of the sample face and a ±180 ° rotation normal to the sample face. The main circle position may be varied by ±1 cm in X and Y directions and ±0.7 cm in the Z direction, which is orthogonal to the plane of the main circle. Additionally, at any position the sample is electrically isolated, fitted with a thermocouple, and may be heated resistively to 1200 °C. The manipulator is UHV compatible and may be baked to 200 °C.