The reactive sputtering of copper in an oxygen/neon rf discharge has been studied using glow discharge mass spectrometry (GDS). Ionized molecular species incident on the substrate table were monitored during sputter deposition of films onto silicon substrates. Films were prepared over an oxygen pressure range that exhibited significant variations in GDS signal levels. These films were characterized by AES, XPS, XRD, and electron microprobe. Good correlation was found between film composition and GDS signal levels.
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Purdes et al. (1977) studied this question.