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January 1, 1992Japanese Journal of Applied PhysicsOpen Access

Plasma Etching of RuO 2 Thin Films

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SKShinji Saito KuramasuPanasonic (Japan)

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Shinji Saito Kuramasu (1992) studied this question.

synapsesocial.com/papers/6a9e7c45ace6465c9e40cd2ahttps://doi.org/10.1143/jjap.31.135
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Also Consider

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  1. 1Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Films1985 · 234 citations
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