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September 15, 1989Journal of Applied Physics

Reactive–fast-atom beam etching of GaAs using Cl2 gas

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Authors

FSFusao ShimokawaKagawa UniversityHTHidenao TanakaHyogo Medical UniversityYUYuji UenishiNTT (Japan)

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Shimokawa et al. (1989) studied this question.

synapsesocial.com/papers/6a9f9eebc2a6bb3d9844a505https://doi.org/10.1063/1.344228
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