Thin films of Fe, Co and their alloys were prepared by ion plating. Metals were evaporated in the argon gas atmosphere of about 0.01 Torr, by applying a dc electric field of 2 kV/15 cm between the substrate and the evaporation source. Since evaporated metal atoms, which were given large kinetic energies by the gas plasma, impinged on the surface of the substrate, a strong adhesion between the ferromagnetic thin films and the substrate could be obtained. Due to the granular structure of the thin film, a higher coercive force and the squareness ratio could be obtained: i.e. by changing the Ar gas pressure, the coercive force and the squareness ratio could be controlled up to 500 Oe and 0.6, respectively, and also they were controlled by choosing the constituents of the mother alloys.
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Takao et al. (1977) studied this question.