Ion energy analysis for sputtering-type electron-cyclotron-resonance microwave plasma

This paper discusses discharge characteristics and ion energy analysis for sputtering-type electron-cyclotron-resonance microwave plasma. Sputtering discharge characteristics directly depend on the microparameters of the microwave plasma. Ionization efficiency of sputtered particles depends on the distance between resonance area and substrate, and ranges from 5% to 10%. The energy profile of ions extracted from the plasma broadens as the sputtering power increases. The application of a mirror field outside the resonance area suppresses the broadening in the energy profile of sputtered ions, and also suppresses the mean energy of the sputtered ion. Finally, the details of ion transport from the plasma to the substrate surface are discussed.