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A computer-controlled electron-beam writing system has been developed. The system has various functions for fabricating thin film micro-optical devices. The ability of 0.1-μm patterning, smooth circular and elliptic scanning of an electron beam, and excellent blazing characteristics have been demonstrated. The system has been confirmed to be an efficient means for fabricating micro-optical devices.
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Shiono et al. (1987) studied this question.
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