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Communication: Silicone films have a wide range of applications. All efforts to date to deposit them have concentrated on PECVD, but ths technique has the problem of introducing defects into the layers as a result of UV irradiation and ion bombardment. A pyrolytic process has te possibility of depositing layers with a lower density of dangling bonds. This paper presents rate and with a similar structure to that of poly(dimethylsiloxane).
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Kwan et al. (1997) studied this question.
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