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July 1, 1987Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Structural order in Si–N and Si–N–O films prepared by plasma assisted chemical vapor deposition process

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Authors

RBR. C. BudhaniUniversity of Nebraska–Lincoln SPShashi PrakashBihar Agricultural University HDH.J. DoerrUniversity of California, Los Angeles

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Budhani et al. (1987) studied this question.

synapsesocial.com/papers/6aa1fef71638f9f59880cde2 https://doi.org/10.1116/1.574538

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