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A new room-temperature imprinting method was developed using liquid-phase hydrogen silsesquioxane (HSQ) with a hard poly(dimethylsiloxane) (h-PDMS) mold. The simultaneous imprinting of arbitrary patterns including both submicron and greater than 100 µm patterns on a 4-in. wafer were replicated at room-temperature and a low pressure with high throughput, because the solvent in HSQ gradually evaporated through the pores of the h-PDMS mold. A bilayer structure was successfully fabricated using as HSQ pattern as an etching mask without removing the residual layer.
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Kang et al. (2010) studied this question.
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