High density nanostructure transfer in soft molding using polyurethane acrylate molds and polyelectrolyte multilayers

Here we present an alternative, new, unconventional lithographic technique developed to create dense and multilevel nanostructure pattern transfer using a highly accurate polyurethane acrylate (PU, MINS101m, Minuta Tech.) mold and a polyelectrolyte multilayer as the adhesion promotion layer. Specifically, we demonstrate the pattern transfer of periodic 80 nm lines with 400 nm height and complex and multilevel nanostructures to a polymer layer on various substrates, such as Si or SiO 2 wafers, glass and flexible polymer films. This new, unconventional lithographic technique presented here would open the door to a variety of applications in the fields of electronic, optical and biological devices.