NiCo (10 at.% of Co) alloy was employed in the formation of metal silicide and germanosilicide as the contact layer which can be used as future complementary metal–oxide–semiconductor source/drain contact.
No takes yet. Share an insight, caveat, or question.
Cheng et al. (2014) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: