Effect of hydrogen peroxide treatment on the characteristics of Pt Schottky contact on n-type ZnO

This is the authors' abstract. We don't add key points for this paper.

We report on the formation of good Pt Schottky contacts on the Zn-terminated n-type ZnO (0001) surfaces (∼2×1017cm−3) using surface treatment with a hydrogen peroxide solution. The Pt contacts on organic solvent-cleaned ZnO (0001) show leaky behavior with a high leakage current of ∼−0.05A under −5V reverse bias voltage, whereas the hydrogen peroxide-treated contacts show Schottky behavior with very low leakage current of ∼−6.5×10−8A under −5V reverse bias voltage. Schottky barrier heights estimated from current-voltage and capacitance-voltage characteristics are 0.89 and 0.93eV, respectively. Room-temperature photoluminescence results show that the hydrogen peroxide treatment is fairly effective in removing deep-level defects near the ZnO surface region. In addition, the preliminary deep-level transient spectroscopy result is also presented.