Evolution of barrier-resistance noise in CoFeB/MgO/CoFeB tunnel junctions during annealing

The low-frequency resistance noise in sputtered-deposited magnetic tunnel junctions with MgO barriers has been measured as a function of annealing time at different annealing temperatures. The noise has a 1/f spectrum and it is quantified by a Hooge-like parameter α given in units of μm2. Unannealed devices have the highest noise levels and their α parameters exhibit a pronounced dependence on the voltage bias across the junction. A significant increase in tunneling magnetoresistance (TMR) is observed for short annealing times (on the order of minutes) at high temperatures and it is correlated with a large reduction in noise and in its bias dependence. The maximum TMR and minimum noise levels are reached at a later time that depends on temperature, being shorter at higher annealing temperatures. Devices annealed at 380 and at 430 °C exhibit the same minimum noise levels, α≈2×10−10 μm2. The origin of the resistance noise, its annealing time evolution, and its bias dependence are discussed and they are attributed to vacancy defects in the MgO barriers.