Nanoimprint replication of nonplanar nanostructure fabricated by focused-ion-beam chemical vapor deposition

Nanoimprint lithography (NIL) is a very useful technique for replicating planar nanostructures at low cost with high throughput, but an expansion from planar to nonplanar will probably be required to enhance the functional capabilities of nanodevices. On the other hand, focused-ion-beam chemical vapor deposition (FIB-CVD) is a promising technology for fabricating nonplanar nanostructures. In this study, the authors demonstrated a new nonplanar replication method using a combination of FIB-CVD and NIL to achieve nonplanar replication with submicrometer feature sizes. Furthermore, they replicated nonplanar nanostructures by using step and repeat NIL.