Fluorinated and hydrogenated amorphous silicon carbon alloy films are prepared by magnetron sputtering of silicon in Ar-H2-CF4 gas mixtures. The dependence of structural, optical, and optoelectronic properties of the films on the partial pressure of CF4 are investigated. It is found that the photosensitivity of magnetron sputtered hydrogenated amorphous silicon is improved by one order of magnitude, accompanied by a slight increase in the optical band gap, by the introduction of CF4.
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Saito et al. (1986) studied this question.
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