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November 1, 1993Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor

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Authors

CCChristine CharlesUniversité Claude Bernard Lyon 1GGG. Giroult-MatlakowskiCentre National de la Recherche ScientifiqueRBR. W. BoswellAustralian National University

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Charles et al. (1993) studied this question.

synapsesocial.com/papers/6aa8f2fd3a20e76294512ea1https://doi.org/10.1116/1.578675
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