The growth behavior of self-standing tungsten tips fabricated by electron-beam-induced deposition using 200keV electrons

Self-standing tungsten tips were fabricated by electron-beam-induced deposition in a 200kV scanning transmission electron microscope to study their growth behavior. By increasing deposition time from 0.2to2400s, the tip growth rate decreases from 5–7nm∕s to zero and the root diameter increases from 2to60–65nm. Tips preferably grow downward at the beginning stage with a saturation length of 80–120nm. Dynamic Monte Carlo simulation was carried out, and 200keV electrons were proved to be more capable to fabricate tip with smaller lateral size and higher ratio than the 20keV electrons.