The Evolution of a Ti Film/Silumin Substrate System Irradiated by a Pulse Electron Beam

The electron beam treatment of metal surfaces involves the use of intense pulsed electron beams to improve a wide range of surface properties of different materials. Research has shown that it can lead to a marked reduction in surface roughness and porosity and a marked increase in tensile strength and ductility. Processed samples also have improved hardness, wear resistance, and anticorrosion properties, which emphasizes the effectiveness of electron beam surface treatment in materials science. This work studies the irradiation of a Ti film/silumin substrate system showing it leads to the transformation of both the Ti film and the silumin layer with different energy densities, which has a different effect on the structure and composition. When treated with an electron beam at an energy density of 30 J/cm2, the Ti film and the silumin layer undergo complete dissolution, resulting in a complex submicron crystalline structure characterized by the presence of silicon particles distributed along grain boundaries. Irradiation with an electron beam of the Ti film/silumin substrate system at different energy densities (10, 15, 30 J/cm2) leads to a change in surface morphology, crystallite size, and phase composition, and an increase in energy density leads to the melting of the Ti film and the silumin layer.