Investigation on interface related charge trap and loss characteristics of high-k based trapping structures by electrostatic force microscopy

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Chenxin Zhu, Zhongguang Xu, Zongliang Huo, Rong Yang, Zhiwei Zheng, Yanxiang Cui, Jing Liu, Yumei Wang, Dongxia Shi, Guangyu Zhang, Fanghua Li, Ming Liu; Investigation on interface related charge trap and loss characteristics of high-k based trapping structures by electrostatic force microscopy. Appl. Phys. Lett. 28 November 2011; 99 (22): 223504. https://doi.org/10.1063/1.3664222 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioApplied Physics Letters Search Advanced Search |Citation Search