The pitting potential of pure aluminum thin films in was measured as a function of implanted Cl fluence. Samples were implanted with at room temperature using fluences from in increments of . An empirical relationship between pitting potential and fluence was found which suggests a critical Cl concentration in the oxide is necessary for pit initiation. No correlation between pitting potential and the measured Cl concentration or distribution in the metal was found.
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Serna et al. (2006) studied this question.
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